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1
Book
Ultrathin SiO2 and high-K materials for ULSI gate dielectrics : symposium held April 5 - 8, 1999, San Francisco, California, USA [at the 1999 MRS spring meeting] /
Huff, H. R.
1999
Subject (ZB):
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ULSI
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2
Book
Gate dielectrics and MOS ULSls : principles, technologies and applications /
Hori, Takashi
1997
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3
Book
Advanced metallization for future ULSI : symposium held April 8-11, 1996, San Francisco, California, USA : [Symposium on Advanced Metallization for Future ULSI] /
Tu, K. N.
1997
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4
Book
ULSI technology /
Chang, C. Y.
1996
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5
Book
Submicrometer metallization: the challenges, opportunities, and limitations : Submicrometer metallization: the challenges, opportunities, and limitations: conference : SPIE symposi...
Kwok, T.
1993
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ULSI
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6
Book
International symposium on ultra large scale integration science and technology . 3: proceedings : ULSI science and technology 1991: proceedings : Washington, DC, 05.05.91-10.05.91...
Andrews, John M.
1991
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Available as
Print Edition
6
Material Type
Book
6
Type of Literature
Conference Publication
4
Handbook, Textbook
1
Year of Publication
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To:
Location
IFF
3
ZB
3
IBN-1-2
2
Name
Andrews, John M.
1
Celler, George K.
1
Chang, C. Y.
1
Hori, Takashi
1
Huff, H. R.
1
Kwok, T.
1
more ...
Tu, K. N.
1
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Subject
ULSI (ultra large scale integration)
6
metallization
3
MIS transistor
1
MOS transistor
1
VLSI (very large scale integration)
1
chemical vapor deposition
1
more ...
construction
1
design
1
dielectric film
1
epitaxy
1
etching
1
fabrication
1
field effect transistor
1
integrated circuit
1
lithography
1
reliability
1
thin film technology
1
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Classification
FGM - Microelectronic technology
3
FGMH - Metallization, physics of microelectronics
3
TBL - VLSI
3
FGK - Thin film technology, epitaxy
2
Language
English
2
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