1
Characterization of plasma enhanced cvd processes: symposium: proceedings : Boston, MA, 27.11.89-28.11.89.
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In situ patterning: selective area deposition and etching: symposium : Boston, MA, 29.11.89-01.12.89.
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Low energy ion beam and plasma modification of materials : Symposium on low energy ion beam and plasma modification of materials : Spring Materials Research Society conference 1991 : Spring MRS conference 1991 : Anaheim, CA, 30.04.91-02.05.91.
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Plasma processing and synthesis of materials : Materials Research Society annual meeting. 1983 : Boston, MA, 14.11.1983-17.11.1983.
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Plasma processing and synthesis of materials. 3 : Plasma processing and synthesis of materials . 3: symposium : San-Francisco, CA, 17.04.90-19.04.90 /
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Plasma processing: symposium : Palo-Alto, CA, 15.04.1986-18.04.1986.
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Plasma synthesis and etching of electronic materials : Symp : Boston, MA, 27.11.1984-30.11.1984.
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Symposium on plasma processing and synthesis of materials : Anaheim, CA, 21.04.87-23.04.87 /
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