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FGKJ - Plasma processing, etching

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FGKJ - Plasma processing, etching

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Books & more: Hits 1 - 20 of 83

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Advances in thin film technology : Sputtering and etching : Materials Research Corporation : sputtering schools. 34 and 35 : Roma, Santa-Barbara, CA, 06.84 ; 11.84.

Weinig, S.
1984

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Applications of plasma processes to VLSI technology /

Sugano, Takuo.
1985

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Arc plasma technology in materials science /

Gerdeman, D. A.
1972

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Ätzpraxis für Halbleiter /

Bogenschütz, August Friedrich.
1967

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Auflösung von Kristallen : Theorie und technische Anwendung /

Heimann, R. B.
1975

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Beschichtungen für Hochleistungsbauteile : Symposium : Hagen, 06.11.1986-07.11.1986

1986

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Bewertung von Plasmareinigungsverfahren als Ergänzung zur Nasschemie : Wuppertal, 18.05.94.

1994

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Characterization of plasma enhanced cvd processes: symposium: proceedings : Boston, MA, 27.11.89-28.11.89.

Lucovsky, G.
1990

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Colloquium on plasma processing for semiconductors, gas discharge and surface aspects : London, 11.10.1984-11.10.1984.

1984

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Columnar structured Thermal Barrier Coatings deposited by axial Suspension Plasma Spraying /

Zhou, Dapeng
2019

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Dry etching for microelectronics.

Powell, R. A.
1984

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Der Einfluss der Versetzungsstruktur auf die Kristallaufloesung /

Schaarwächter, Werner
1967

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Elektrochemische Leiterplattenätzung mit geschlossenem Elektrolytkreislauf.

Faul, Wolfgang.
1976

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Etching compositions and processes.

Collie, M. J.
1982

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Etching for pattern definition: proceedings of the symposium : Electrochemical Society: spring meeting. 1976 : Washington, DC, 02.05.1976-07.05.1976.

Hughes, H. G.
1976

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Etching of crystals : theory, experiment, and application /

Sangwal, Keshra.
1987

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Etching of III-V semiconductors : an electrochemical approach /

Notten, P. H. L.
1991

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Field assisted sintering of yttria ceramics for plasma etching applications /

Kindelmann, Moritz
2021

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Glow discharge processes : sputtering and plasma etching /

Chapman, Brian N.
1980

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La gravure seche et le depot plasma en microelectronique: symposium international. 0003 : Cachan, 26.11.1985-29.11.1985.

1985

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Print Edition

Book 83

Conference Publication 33 Handbook, Textbook 6 Theses 5

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ZB 79 IEK-4 5 IBN-1-2 3 IFF 3 IBN-3-4 1 IEK-5 1 more ... INM-5 1 see all ... less ...

Apelian, Diran 2 Broszeit, E. 2 Flamm, Daniel L. 2 Heimann, R. B. 2 Pulker, H. K. 2 Szekely, Julian 2 more ... Allen, Susan D. 1 Ambacher, Oliver 1 Anders, Andre 1 Annett, D. M. 1 Arata, Yoshiaki 1 Auciello, Orlando 1 Beckert, M. 1 Benko, B. 1 Bergmann, E. 1 Bernhardt, A. F. 1 Bock, F. 1 Bogenschütz, August Friedrich. 1 Brauer, K. H. 1 Chang, R. P. 1 Chapman, Brian N. 1 Cheremisinoff, Paul N. 1 Coburn, J. W. 1 Collie, M. J. 1 D' Agostino, Riccardo. 1 Datta, Madhav 1 Dembovsky, V. 1 Eichhorn, F. 1 Einspruch, N. G. 1 Farah, Oscar G. 1 see all ... less ...

plasma processing 21 etching 19 plasma etching 16 plasma deposition 11 thin film technology 5 chemical vapor deposition 4 more ... electron beam processing 3 ion beam processing 3 ion implantation 3 laser processing 3 materials processing 3 plasma physics 3 sputter deposition 3 surface modification 3 III - V semiconductor 2 cold plasma 2 evaporation 2 plasma 2 plasma arc spraying 2 plasma diagnostics 2 plasma wall interaction 2 silicon 2 spray coating 2 sputtering 2 vacuum deposition 2 amorphous silicon 1 beam processing 1 biological aspect 1 ceramics 1 cleaning 1 see all ... less ...

FGKJ - Plasma processing, etching FAF - Materials research - comprehensive works 8 FGGE - Ion beam surface modification 5 FGJ - Laser and electron beam processing 5 FGKC - Vacuum deposition, MBE 5 FGM - Microelectronic technology 5 more ... FPUG - Special purpose coatings 4 PGA - Plasma physics 4 FGK - Thin film technology, epitaxy 3 FPQ - Surface friction, hardness, wear, lubrication 3 CLD - High temperature chemistry, plasma chemistry 2 FGGB - Ion implantation, ion beam synthesis 2 FGKF - Chemical vapor deposition 2 FJKB - Elemental semiconductors 2 FJKC - III - V semiconductors 2 FMGE - Metallographic specimen preparation 2 FPU - Corrosion protection, surface coating 2 FPUJ - Surface engineering 2 PGCC - Electric discharges in gases 2 CER - Macromolecular compounds - synthesis and reactions 1 EISF - Thin film solar cells 1 FAQ - Materials research - institutions, research and development 1 FDCD - Dislocations 1 FFP - Physics of thin films 1 FGA - Materials processing - general aspects 1 FGCD - Crystal growth of specific substances 1 FGCK - Crystal technology 1 FGG - Ion beam technology 1 FGT - Microtechnology 1 FJEC - Amorphous semiconductors 1 see all ... less ...

English 11 German 6

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