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FGKJ - Plasma processing, etching
plasma wall interaction
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FGKJ - Plasma processing, etching
plasma wall interaction
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1
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Low temperature plasma physics : fundamental aspects and applications /
Hippler, Rainer
2001
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Plasma chemistry. 3.
Veprek, S.
1980
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2
INM-5
1
Name
Hippler, Rainer
1
Veprek, S.
1
Subject
plasma etching
2
plasma wall interaction
plasma deposition
1
plasma diagnostics
1
plasma physics
1
plasma processing
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surface modification
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Classification
FGKJ - Plasma processing, etching
CLD - High temperature chemistry, plasma chemistry
1
PGLJ - Plasma wall interaction, divertors
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