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IBN-1-2
TBL - VLSI
chemical vapor deposition
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IBN-1-2
TBL - VLSI
chemical vapor deposition
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ULSI technology /
Chang, C. Y.
1996
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IBN-1-2
IFF
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Chang, C. Y.
1
Subject
ULSI (ultra large scale integration)
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chemical vapor deposition
epitaxy
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fabrication
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lithography
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FGK - Thin film technology, epitaxy
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FGM - Microelectronic technology
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TBL - VLSI
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