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FGK - Thin film technology, epitaxy
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FGKF - Chemical vapor deposition
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FGK - Thin film technology, epitaxy
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FGKF - Chemical vapor deposition
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Entwicklung und Aufbau einer neuartigen MOCVD-Anlage zum Wachstum ferroelektrischer Dünnschichten [E-Book] /
Schäfer, Patrick Ralf
2002
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Untersuchung des selbstorganisierenden Wachstums von Ge-C-Si/Si-Strukturen im Hinblick auf nulldimensionale Effekte [E-Book] /
Goryll, Michael
2001
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ZB
2
Name
Goryll, Michael
1
Schäfer, Patrick Ralf
1
Subject
chemical vapor deposition
2
ferroelectric material
1
photoluminescence
1
semiconductor heterostructure
1
thin film technology
1
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FGK - Thin film technology, epitaxy
FGKF - Chemical vapor deposition
FFPG - Multilayer systems, quantum structures
1
FJBE - Ferroelectric materials
1
Language
German
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