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epitaxy
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chemical vapor deposition
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1
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Atomlagenabscheidung von Hafniumoxid /
Zilbauer, Thomas
2010
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Supercritical Si(1-x)Ge(x)alloy layers for optoelectronic applications grown by athmospheric pressure chemical vapor deposition [E-Book] /
Grimm, Karsten
2001
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Grimm, Karsten
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Zilbauer, Thomas
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chemical vapor deposition
epitaxy
electroluminescence
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photoluminescence
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semiconductor heterostructure
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thin film technology
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FFPE - Thin film electronic properties, semiconductor interfaces
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FFPG - Multilayer systems, quantum structures
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FGK - Thin film technology, epitaxy
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FGKF - Chemical vapor deposition
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