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Baumann, P. K.
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Ehrhart, P.
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Jia, C. L.
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Lindner, J.
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Schumacher, M.
Elektrokeramische Materialien; IFF-EKM
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Baumann, P. K.
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Ehrhart, P.
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Jia, C. L.
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Lindner, J.
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Schumacher, M.
Elektrokeramische Materialien; IFF-EKM
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Conference Presentation
Comparison of hafnium precursors for the MOCVD of HfO2 for gate dielectric applications
Teren, A. R.
2003
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Baumann, P. K.
Ehrhart, P.
He, J. Q.
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Materialien, Prozesse und Bauelemente für die Mikro- und Nanoelektronik
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Mikrostrukturforschung; IFF-IMF
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