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Mantl, S.
JARA-FIT; JARA-FIT
AND
Prozesstechnologie; IBN-PT
Grundlagen für zukünftige Informationstechnologien
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Mantl, S.
JARA-FIT; JARA-FIT
AND
Prozesstechnologie; IBN-PT
Grundlagen für zukünftige Informationstechnologien
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Select result number 1
1
Poster
Strain and charge transport in ion implanted strained Si nanowires on insulator
Minamisawa, R. A.
2010
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2
Journal Article
Electrical characterization of strained and unstrained silicon nanowires with nickel silicide contacts
Habicht, S.
2010
Nanotechnology, 21 (2010) S. 105701
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2
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Journal Article
1
Poster
1
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Ghyselen, B.
2
Habicht, S.
2
Mantl, S.
Trellenkamp, Stefan
2
Buca, Dan Mihai
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Carius, R.
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Feste, S. F.
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Knoll, L.
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Minamisawa, R. A.
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Research Program
Grundlagen für zukünftige Informationstechnologien
Silicon-based nanostructures and nanodevices for long term nanoelectronics applications
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Halbleiter-Nanoelektronik; IBN-1
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JARA-FIT; JARA-FIT
Prozesstechnologie; IBN-PT
Photovoltaik; IEF-5
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2010
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