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Elektrokeramische Materialien; IFF-EKM
Schumacher, M.
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Elektrokeramische Materialien; IFF-EKM
Schumacher, M.
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Growth of (Ba,Sr)TiO3 thin films by MOCVD: stoichiometry effects
Ehrhart, P.
2003
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Comparison of hafnium precursors for the MOCVD of HfO2 for gate dielectric applications
Teren, A. R.
2003
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MOCVD of (BaSr)TiO3: Nucleation and growth
Regnery, S.
2003
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Nucleation and growth of thin (Ba,Sr)TiO3 films in a MOCVD reactor
Regnery, S.
2003
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4
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Conference Presentation
2
Contribution to a book
1
Contribution to a conference proceedings
1
Poster
1
Name
Ehrhart, P.
4
Schumacher, M.
Waser, R.
4
Jia, C. L.
3
Regnery, S.
3
Fitsilis, F.
2
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McEntee, T.
2
Schienle, F.
2
Szot, K.
2
Baumann, P. K.
1
Ding, Y.
1
He, J. Q.
1
Jones, A. C.
1
Jürgensen, H.
1
Krumpen, W.
1
Leedham, T. J.
1
Lindner, J.
1
Rushworth, S. R.
1
Teren, A. R.
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Research Program
Materialien, Prozesse und Bauelemente für die Mikro- und Nanoelektronik
4
Contributing Institute
Elektrokeramische Materialien; IFF-EKM
Mikrostrukturforschung; IFF-IMF
3
Zentralabteilung für Chemische Analysen; ZCH
1
Scientific Report
2003
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