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Mixed amide-malonate compound of hafnium as a novel monomeric precursor for MOCVD of HfO2 thin films
Milanov, A.
2006
2006
Journal of materials chemistry, 16 (2006) S. 437
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Regnery, S.
2005
2005
Journal of applied physics, 98 (2005) S. 084904-1 - 084904-12
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