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1

Characterization of layers and interfaces during the silicide formation of CoSix and NiSiy

Breuer, U.
2005

“...2005...”

2

Journal Article

Surface characterisation and interface studies of high-k materials by XPS and TOF-SIMS

Besmehn, A.
2005

Applied surface science, 252 (2005) S. 172 - 176

“...2005...”

3

Journal Article

Tuning of NiSi/Si Schottky barrier heights by sulfur segregation during Ni silicidation

Zhao, Q. T.
2005

Applied physics letters, 86 (2005) S. 062109-1 - 062109-3

“...2005...”
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