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Grundlagen für zukünftige Informationstechnologien
Lenk, Steffi
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Grundlagen für zukünftige Informationstechnologien
Lenk, Steffi
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Journal Article
Tailoring of epitaxial CoSi2/Si nanostructures by low temperature wet oxidation
Kluth, P.
2005
Nanotechnology, 16 (2005) S. 2718 - 2720
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Tuning of NiSi/Si Schottky barrier heights by sulfur segregaton during Ni silicidation and fabrication of Schottky MOSFETs
Zhao, Q. T.
2005
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Dopant segregation in Schottky barrier SOI-MOSFETs
Zhang, M.
2005
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Contribution to a book
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Lenk, Steffi
Mantl, S.
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Zhao, Q. T.
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Zhang, M.
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Grundlagen für zukünftige Informationstechnologien
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Center of Nanoelectronic Systems for Information Technology; CNI
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Institut für Halbleiterschichten und Bauelemente; ISG-1
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Halbleiter-Nanoelektronik; IBN-1
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Scientific Report
2005
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