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1

Talk (non-conference)

Spannungsrelaxation von Si(1-x)Gex/Si Heterostrukturen induziert durch Wasserstoffimplantation

Rongen, S.
1999

2

Talk (non-conference)

Strain relaxed Si(1-x)Gex layers on Si(100) after hydrogen implantation

Holländer, B.
1999

3

New high-precision 5-Axis RBS/channeling goniometer for ion beam analysis of 150 mm wafers

Holländer, B.
1999

4

Journal Article

Enhanced strain relaxation of epitaxial SiGe layers on Si(100)after H+ ion implantation

Holländer, B.
1999

Nuclear instruments & methods in physics research / B, 148 (1999) S. 200

5

Journal Article

Strain relaxation of epitaxial SiGe layers on Si(100) improved by hydrogen implantation

Mantl, S.
1999

Nuclear instruments & methods in physics research / B, 147 (1999) S. 29

6

Journal Article

Silicon quantum integrated circuits : an attempt to fabricate silicon-based quantum devices using CMOS fabrication techniques

Paul, D. J.
1999

Thin solid films, 336 (1999) S. 130

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