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1
Journal Article
LaLuO3 higher-k dielectric integration in SOI MOSFETs with a gate-first process
Nichau, A.
2012
Solid state electronics, 71 (2012) S. 19 - 24
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Lenk
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2
Contribution to a book
Electrical and structural properties of ternary rare-earth oxides on Si and higher mobility substrates and their integration as high-k gate dielectrics in MOSFET devices
Lopes, J.M.J.
2011
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3
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Lanthanum Lutetium oxide integration in a gate-first process on SOI MOSFETs
Nichau, A.
2011
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Lenk
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4
Journal Article
Atomic layer deposition of HfO2 and Al2O3 layers on 300 mm Si wafers for gate stack technology
Lupták, R.
2011
Journal of vacuum science & technology / B, 29 (2011) S. 01A301
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5
Conference Presentation
Lanthanum Lutetium oxide integration in a gate-first process on SOI MOSFETs
Nichau, A.
2011
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Lenk
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5
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Contribution to a book
2
Journal Article
2
Conference Presentation
1
Contribution to a conference proceedings
1
Name
Besmehn, A.
5
Lenk, Steffi
5
Lopes, J.M.J.
5
Mantl, S.
5
Schnee, M.
5
Schubert, Jürgen
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Dürgün-Özben, Eylem
4
Habicht, S.
4
Luptak, R.
4
Nichau, A.
4
Zhao, Q.T.
4
Buca, Dan Mihai
3
Castro, G.R.
3
Knoll, L.
3
Luysberg, Martina
3
Mussmann, V.
3
Rubio-Zuazo, J.
3
Breuer, U.
2
Tiedemann, Andreas
2
Baumann, P.K.
1
Durgun Özben, E.
1
Feste, S.
1
Heuken, M.
1
Holländer, Bernhard
1
Lupták, R.
1
Luysberg, M.
1
Yu, W.
1
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Research Program
Grundlagen für zukünftige Informationstechnologien
5
Contributing Institute
Halbleiter-Nanoelektronik; PGI-9
5
JARA-FIT; JARA-FIT
5
Mikrostrukturforschung; PGI-5
3
Zentralabteilung für Chemische Analysen; ZCH
3
Halbleiter-Nanoelektronik; IBN-1
1
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2011
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