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Lithography for VLSI.

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Personal Name(s): Einspruch, N. G., editor
Imprint: Orlando,FL : Academic Pr., 1987.
Physical Description: XI, 361 S.
Note: englisch
ISBN: 0122341163
9780122341168
Series Title: VLSI electronics microstructure science ; 16.
Keywords: optical lithography
lumped parameter model for optical lithography
the evolution of electron beam pattern generators for integrated circuit masks
electron resist process modeling
ion beam lithography
alignment techniques in optical and x-ray lithography
metrology in microlithography
electrical measurements for microlithography characterization
Subject (ZB):
optical microlithography
Classification:
FGM - Microelectronic technology
FGME - Microlithography
Shelf Classification:
FGM - Mikroelektronik - Technologie
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Reading Room Call Number: FGM 019-16 Barcode: 1088105915 Available   

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