Lithography for VLSI.
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| Personal Name(s): | Einspruch, N. G., editor |
|---|---|
| Imprint: |
Orlando,FL :
Academic Pr.,
1987.
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| Physical Description: |
XI, 361 S. |
| Note: |
englisch |
| ISBN: |
0122341163 9780122341168 |
| Series Title: |
VLSI electronics microstructure science ;
16. |
| Keywords: |
optical lithography lumped parameter model for optical lithography the evolution of electron beam pattern generators for integrated circuit masks electron resist process modeling ion beam lithography alignment techniques in optical and x-ray lithography metrology in microlithography electrical measurements for microlithography characterization |
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Reading Room  Call Number: FGM 019-16 Barcode: 1088105915
Available
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