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Ion beam assisted film growth.

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Personal Name(s): Itoh, T., editor
Imprint: Amsterdam : Elsevier, 1989.
Physical Description: XVII, 439 S.
Note: englisch
ISBN: 9780444872807
0444872809
Series Title: Beam modification of materials ; vol 0003.
Keywords: ion beam assisted film growth - overview
film growth by ion beam plasma discharge sputtering method
preparation and characterization of II-VI semiconductor films by sputtering
sputtering yield
low energy ion surface interaction during film growth from the vapor phase
ion beam mixing
partially ionized molecular beam epitaxy
ionized cluster beam deposition
direct ion beam deposition
film growth by utilizing ionized carbon beam
molecular beam epitaxy of III-V semiconductor heterostructures using mass separated low energy ion beam
ion beam synthesis of films
Classification:
FGGE - Ion beam surface modification
Shelf Classification:
FGG - Ionenstrahltechnologie
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