Ion beam assisted film growth.
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| Personal Name(s): | Itoh, T., editor |
|---|---|
| Imprint: |
Amsterdam :
Elsevier,
1989.
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| Physical Description: |
XVII, 439 S. |
| Note: |
englisch |
| ISBN: |
9780444872807 0444872809 |
| Series Title: |
Beam modification of materials ;
vol 0003. |
| Keywords: |
ion beam assisted film growth - overview film growth by ion beam plasma discharge sputtering method preparation and characterization of II-VI semiconductor films by sputtering sputtering yield low energy ion surface interaction during film growth from the vapor phase ion beam mixing partially ionized molecular beam epitaxy ionized cluster beam deposition direct ion beam deposition film growth by utilizing ionized carbon beam molecular beam epitaxy of III-V semiconductor heterostructures using mass separated low energy ion beam ion beam synthesis of films |
| Classification: | |
| Shelf Classification: |
| ZB | |
|---|---|
Reading Room  Call Number: FGG 078 Barcode: 1089104925
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