Sputtering by particle bombardment vol 0003: characteristics of sputtered particles, technical applications.
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| Personal Name(s): | Behrisch, R., editor |
|---|---|
| Imprint: |
Berlin :
Springer,
1991.
|
| Physical Description: |
XIII, 410 S. |
| Note: |
englisch |
| ISBN: |
3540534288 9783540534280 9780387534282 0387534288 |
| Series Title: |
Topics in applied physics ;
vol 0064. |
| Keywords: |
angular, energy, and mass distribution of sputtered particles charged and excited states of sputtered atoms surface and depth analysis based on sputtering desorption of organic molecules from solid and liquid surfaces induced by particle impact production of microstructures by ion beam sputtering production of thin films by controlled deposition of sputtered material |
| Subject (ZB): | |
| Classification: | |
| Shelf Classification: |
Call Number: FGK 045-03 Barcode: 1091105531
