Handbook of crystal growth vol 0003: thin films and epitaxy : Part A: basic techniques.
Thin films and epitaxy: basic techniques
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| Personal Name(s): | Hurle, D. T., editor |
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| Imprint: |
Amsterdam :
Elsevier,
1994.
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| Physical Description: |
XII, 456 S. |
| Note: |
englisch |
| ISBN: |
0444815562 9780444815569 |
| Series Title: |
Handbook of crystal growth ;
3A. |
| Keywords: |
halogen transport epitaxy levitation epitaxy the principles and practice of organometallic vapor phase epitaxy principles of molecular beam epitaxy molecular beam epitaxy with gaseous source liquid phase epitaxy solid phase epitaxy rapid solidification of silicon and some silicides by pulsed laser annealing pulsed laser ablation/deposition of multicomponent oxide thin films: basic laser ablation and deposition processes and influence on film characteristics growth of diamond films from the vapor phase |
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Reading Room  Call Number: FGC 001-03A Barcode: 1095100303
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Open Stacks Call Number: B 072153'01'-003A Barcode: 1095100180
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