Advances in epitaxy and endotaxy : selected chemical problems / edited by H. G. Schneider and V. Ruth, with the cooperation of T. Kormany.
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| Personal Name(s): | Schneider, Helmut Günther. |
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| Ruth, Volker. / Normany, T. | |
| Imprint: |
Amsterdam, New York :
Elsevier Scientific Pub. Co.,
1976.
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| Physical Description: |
344 p. |
| Note: |
englisch |
| ISBN: |
0444998454 9780444998453 |
| Keywords: |
technological significance of epitaxial and endotaxial intergrowth processes for the production of discrete electronic components and integrated microelectronic circuits the formation of epitaxial semiconductor films by chemical vapor deposition (CVD) formation of epitaxial semiconductor layers by evaporation and interdiffusion under isothermal conditions formation of epitaxial semiconductor films by crystal growth from the melt chemoepitaxial and chemoendotaxial layer growth on metals |
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Open Stacks  Call Number: B 043602'01' Barcode: 1076006534
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