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Cover Image

Resists in microlithography and printing.

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Personal Name(s): Bednar, B.
Kralicek, J. / Zachoval, J. / Yeltsov, A. V., Mitarb.
Imprint: Amsterdam : Elsevier, 1993.
Physical Description: 376 S.
Note: Aus d. Tsch. uebers.
englisch
ISBN: 0444988467
9780444988461
Series Title: Materials science monographs ; vol 0076.
Subject (ZB):
microlithography
printing
lithography
interaction
ionizing radiation
atom
molecule
polymer
Classification:
FGME - Microlithography
Shelf Classification:
FGM - Mikroelektronik - Technologie
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Reading Room Call Number: FGM 011 Barcode: 1095100286 Available   

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