Handbook of ion beam processing technology : principles, deposition, film modification, and synthesis / edited by Jerome J. Cuomo ...
Ion beam processing technology :
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Personal Name(s): | Cuomo, Jerome J., editor |
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Imprint: |
Park Ridge, N.J., U.S.A. :
Noyes Publications,
1989.
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Physical Description: |
xviii, 438 p. |
Note: |
englisch |
ISBN: |
081551199X 9780815511991 |
Keywords: |
gridded broad beam ion sources electron cyclotron resonance (ECR) ion sources Hall effect ion sources ionized cluster beam (ICB) deposition and epitaxy quantitative sputtering laser induced fluorescence as a tool for the study of ion beam sputtering characterization of atoms desorbed from surfaces by ion bombardment using multiphoton ionization detection application of postionization for sputtering studies and surface or thin film analysis the modification of films by ion bombardment control of film properties by ion assisted deposition using broad beam sources etching with directed ion beams film growth modification by concurrent ion bombardment: theory and simulation interface structure and thin film adhesion modification of thin films by off- normal incidence ion bombardment ion beam interactions with polymer surfaces ion beam topography: texturing effects methods and techniques of ion beam processes ion assisted dielectric and optical coatings diamond and diamondlike thin films by ion beam techniques |
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