Dusty plasmas : physics, chemistry and technological impacts in plasma processing / ed. by Andre Bouchoule.

Saved in:
Bouchoule, Andre, (editor)
Chichester : Wiley, 1999.
VIII, 408 S.
englisch
0471973866
9780471973867
plasma enhanced chemical vapor deposition
Table of Contents

IEK-4
Institute Call Number: B 092244'01' Barcode: 1207102742 Available