Dusty plasmas : physics, chemistry and technological impacts in plasma processing / ed. by Andre Bouchoule.
Saved in:
Table of Contents |
|
Personal Name(s): | Bouchoule, Andre, editor |
Imprint: |
Chichester :
Wiley,
1999.
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Physical Description: |
VIII, 408 S. |
Note: |
englisch |
ISBN: |
0471973866 9780471973867 |
Keywords: |
plasma enhanced chemical vapor deposition |
Subject (ZB): | |
Classification: |
IEK-4 | |
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Institute Call number: B 092244'01' Barcode: 1207102742 Available |