Chemical vapor deposition of tungsten and tungsten silicides for VLSI/ULSI applications / by John E.J. Schmitz.
chemical vapor deposition of tungsten and tungsten silicides for vlsi\ulsi applications :
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Personal Name(s): | Schmitz, John E. J. |
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Imprint: |
Park Ridge, N.J., U.S.A. :
Noyes Publications,
1992.
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Physical Description: |
xvi, 235 p. |
Note: |
englisch |
ISBN: |
9780815512882 0815512880 |
Series Title: |
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Materials science and process technology series.
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Reading Room Call number: FGM 149 Barcode: 1094102342 Available |