Electron beam, x-ray, and ion beam technology: submicrometer lithographies. 0008: proceedings : San-Jose, CA, 01.03.89-03.03.89.
ion beam lithography
Saved in:
Personal Name(s): | Yanof, A. W., editor |
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Imprint: |
Bellingham, WA :
SPIE-The International Society for Optical Engineering,
1989.
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Physical Description: |
VIII, 388 S. |
Note: |
englisch |
ISBN: |
9780819401243 0819401242 |
Series Title: |
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SPIE proceedings ;
vol 1089. |
Classification: | |
Shelf Classification: |
ZB | |
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Reading Room Call number: FGM 092-08 Barcode: 1090100943 Available |