Electron beam, x-ray and ion beam technology: submicrometer lithographies. 0007: conference : Santa-Clara, CA, 02.03.88-04.03.88.
x-ray lithography
Saved in:
Personal Name(s): | Yanof, A. W., editor |
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Imprint: |
Bellingham,WA :
International Society for Optical Engineering,
1988.
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Physical Description: |
VI, 307 S. |
Note: |
englisch |
ISBN: |
9780892529582 089252958X |
Series Title: |
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Proceedings of SPIE-The International Society for Optical Engineering ;
vol 0923. |
Classification: | |
Shelf Classification: |
ZB | |
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Reading Room Call number: FGM 092-07 Barcode: 1089103592 Available |