Plasma Processing of Semiconductors [E-Book] / edited by P. F. Williams.
Plasma Processing of Semiconductors contains 28 contributions from 18 experts and covers plasma etching, plasma deposition, plasma-surface interactions, numerical modelling, plasma diagnostics, less conventional processing applications of plasmas, and industrial applications. Audience: Coverage rang...
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Full text |
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Personal Name(s): | Williams, P. F., editor |
Imprint: |
Dordrecht :
Springer Netherlands,
1997
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Physical Description: |
X, 613 p. online resource. |
Note: |
englisch |
ISBN: |
9789401158848 |
DOI: |
10.1007/978-94-011-5884-8 |
Series Title: |
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NATO ASI Series, Serie E: Applied Sciences ;
336 |
Subject (LOC): |
- Plasma Etching
- to Plasma Etching
- Plasma Chemistry, Basic Processes and PECVD
- The Role of Ions in Reactive Ion Etching with Low Density Plasmas
- SiO2 Etching in High-Density Plasmas: Differences with Low-Density Plasmas
- Plasma Deposition
- to Plasma Enhanced Chemical Vapor Deposition
- Topography Evolution During Semiconductor Processing
- Deposition of Amorphous Silicon
- Plasma Sources
- High Density Sources for Plasma Etching
- Resonant Plasma Excitation by Electron Cyclotron Waves—Fundamentals and Applications
- The Transition from Capacitive to Inductive to Wave Sustained Discharges
- Physics of Surface-Wave Discharges
- Plasma-Surface Interactions
- Surface Science Aspects of Etching and Wall Reactions in High Density Plasmas
- Plasma-Surface Interactions
- Cl2 Plasma-Si Surface Interactions in Plasma Etching
- Numerical Modeling
- Particle in Cell Monte Carlo Collision Codes (PIC-MCC); Methods and Applications to Plasma Processing
- Fluid and Hybrid Models of Non Equilibrium Discharges
- Plasma Diagnostics
- Optical Diagnostics of Processing Plasmas
- Optical Diagnostics of Plasmas: A Tool for Process Control
- Infrared Absorption Spectroscopy as a Diagnostic for Processing Plasmas
- Ellipsometric Analysis of Plasma Deposited and Plasma Etched Materials
- Mass Spectrometry of Reactive Plasmas
- Less Conventional Processing Applications of Plasmas
- Deposition of Silicon Dioxide Films using the Helicon Diffusion Reactor for Integrated Optics Applications
- Remote Plasma Processing
- Magnetized Surface-Wave Discharges for Submicrometer Pattern Transfer
- Dusty Plasmas: Fundamental Aspects and Industrial Applications
- Industrial Application of Plasmas for Processing
- Low Energy Plasma Beams for Semiconductor Technology
- Process Control Concepts
- Issues and Solutions for Applying Process Control to Semiconductor Manufacturing.