Ion Implantation Techniques [E-Book] : Lectures given at the Ion Implantation School in Connection with Fourth International Conference on Ion Implantation: Equipment and Techniques Berchtesgaden, Fed. Rep. of Germany, September 13–15, 1982 / edited by Heiner Ryssel, Hans Glawischnig.
Saved in:
Full text |
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Personal Name(s): | Glawischnig, Hans, editor |
Ryssel, Heiner, editor | |
Imprint: |
Berlin, Heidelberg :
Springer,
1982
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Physical Description: |
XII, 374 p. online resource. |
Note: |
englisch |
ISBN: |
9783642687792 |
DOI: |
10.1007/978-3-642-68779-2 |
Series Title: |
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Springer Series in Electrophysics ;
10 |
Subject (LOC): |
- I Machine Aspects of Ion Implantation
- Ion Implantation System Concepts
- Ion Sources
- Faraday Cup Designs for Ion Implantation
- Safety and Ion Implanters
- II Ion Ranges in Solids
- The Stopping and Range of Ions in Solids
- The Calculation of Ion Ranges in Solids with Analytic Solutions
- Range Distributions
- III Measuring Techniques and Annealing
- Electrical Measuring Techniques
- Wafer Mapping Techniques for Characterization of Ion Implantation Processing
- Non-Electrical Measuring Techniques
- Annealing and Residual Damage
- IV Appendix: Modern Ion Implantation Equipment TM
- Evolution and Performance of the Nova NV-10 Predep™ Implanter
- Ion Implantation Equipment from Veeco
- The Series III A and IIIX Ion Implanters
- Standard High-Voltage Power Supplies for Ion Implantation
- The IONMICROPROBE A-DIDA 3000-30 for Dopant Depth Profiling and Impurity Bulk Analysis
- List of Contributors.