This title appears in the Scientific Report :
2023
Please use the identifier:
http://dx.doi.org/10.1021/acs.cgd.2c01134 in citations.
Migration-Enhanced Metal–Organic Chemical Vapor Deposition of Wafer-Scale Fully Coalesced WS 2 and WSe 2 Monolayers
Migration-Enhanced Metal–Organic Chemical Vapor Deposition of Wafer-Scale Fully Coalesced WS 2 and WSe 2 Monolayers
Saved in:
Personal Name(s): | Tang, Songyao (Corresponding author) |
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Grundmann, Annika / Fiadziushkin, Hleb / Wang, Zhaodong / Hoffmann-Eifert, Susanne / Ghiami, Amir / Debald, Arne / Heuken, Michael / Vescan, Andrei / Kalisch, Holger | |
Contributing Institute: |
Elektronische Materialien; PGI-7 JARA Institut Green IT; PGI-10 JARA-FIT; JARA-FIT |
Published in: | Crystal growth & design, 23 (2023) 3, S. 1547 - 1558 |
Imprint: |
Washington, DC
ACS Publ.
2023
|
DOI: |
10.1021/acs.cgd.2c01134 |
Document Type: |
Journal Article |
Research Program: |
Verbundprojekt: Neuro-inspirierte Technologien der künstlichen Intelligenz für die Elektronik der Zukunft - NEUROTEC II - Memristive Materials and Devices |
Publikationsportal JuSER |
Description not available. |