This title appears in the Scientific Report :
2024
Please use the identifier:
http://dx.doi.org/10.3390/nanomanufacturing4020007 in citations.
Please use the identifier: http://dx.doi.org/10.34734/FZJ-2024-03100 in citations.
Developments in Mask-Free Singularly Addressable Nano-LED Lithography
Developments in Mask-Free Singularly Addressable Nano-LED Lithography
LED devices are increasingly gaining importance in lithography approaches due to the fact that they can be used flexibly for mask-less patterning. In this study, we briefly report on developments in mask-free lithography approaches based on nano-LED devices and summarize our current achievements in...
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Personal Name(s): | Mikulics, Martin (Corresponding author) |
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Winden, Andreas / Mayer, Joachim / Hardtdegen, Hilde (Corresponding author) | |
Contributing Institute: |
Materialwissenschaft u. Werkstofftechnik; ER-C-2 |
Published in: | Nanomanufacturing, 4 (2024) 2, S. 99-110 |
Imprint: |
Basel, Switzerland
MDPI
2024
|
DOI: |
10.3390/nanomanufacturing4020007 |
DOI: |
10.34734/FZJ-2024-03100 |
Document Type: |
Journal Article |
Research Program: |
Understanding the Structural and Functional Behavior of Solid State Systems |
Link: |
OpenAccess |
Publikationsportal JuSER |
Please use the identifier: http://dx.doi.org/10.34734/FZJ-2024-03100 in citations.
LED devices are increasingly gaining importance in lithography approaches due to the fact that they can be used flexibly for mask-less patterning. In this study, we briefly report on developments in mask-free lithography approaches based on nano-LED devices and summarize our current achievements in the different building blocks needed for its application. Individually addressable nano-LED structures can form the basis for an unprecedented fast and flexible patterning, on demand, in photo-chemically sensitive films. We introduce a driving scheme for nano-LEDs in arrays serving for a singularly addressable approach. Furthermore, we discuss the challenges facing nano-LED fabrication and possibilities to improve their performance. Additionally, we introduce LED structures based on a hybrid nanocrystal/nano-LED approach. Lastly, we provide an outlook how this approach could further develop for next generation lithography systems. This technique has a huge potential to revolutionize the field and to contribute significantly to energy and resources saving device nanomanufacturing. |