This title appears in the Scientific Report :
2012
Effect of ALD processing and top electrodes on ZrO2 thin films structural and resistive switching characteristics
Effect of ALD processing and top electrodes on ZrO2 thin films structural and resistive switching characteristics
Saved in:
Personal Name(s): | Kärkkänen, I. |
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Heikkilä, M. / Niinistö, J. / Ritala, M. / Leskelä, M. / Hoffmann-Eifert, S. / Waser, R. | |
Contributing Institute: |
JARA-FIT; JARA-FIT Elektronische Materialien; PGI-7 |
Published in: |
Nature Conference on Frontiers in Electronic Materials |
Imprint: |
2012
|
Conference: | Aachen 2012-06-17 |
Document Type: |
Poster |
Research Program: |
Grundlagen für zukünftige Informationstechnologien |
Publikationsportal JuSER |
Description not available. |