This title appears in the Scientific Report :
2012
ALD oxide thin films for resistive memory applications
ALD oxide thin films for resistive memory applications
Saved in:
Personal Name(s): | Hoffmann-Eifert, S. |
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Contributing Institute: |
Elektronische Materialien; PGI-7 JARA-FIT; JARA-FIT |
Published in: |
2nd Enhance MC-INT Winter School |
Imprint: |
2012
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Conference: | Helsinki, Finland 2012-01-09 |
Document Type: |
Conference Presentation |
Research Program: |
Grundlagen für zukünftige Informationstechnologien |
Publikationsportal JuSER |
Description not available. |