This title appears in the Scientific Report :
2012
ALD process control for tailoring the nanostructure of TiO2 films for resistive switching applications
ALD process control for tailoring the nanostructure of TiO2 films for resistive switching applications
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Personal Name(s): | Reiners, M. |
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Aslam, N. / Lentz, F. / Hoffmann-Eifert, S. / Waser, R. | |
Contributing Institute: |
JARA-FIT; JARA-FIT Elektronische Materialien; PGI-7 |
Published in: |
Nature Conference on Frontiers in Electronic Materials: Correlation Effects and Memristive Phenomena |
Imprint: |
2012
|
Conference: | Aachen 2012-06-17 |
Document Type: |
Conference Presentation |
Research Program: |
Grundlagen für zukünftige Informationstechnologien |
Publikationsportal JuSER |
Description not available. |