This title appears in the Scientific Report :
2012
Atomic layer deposition of TiO2 by TDMAT and H2O for resistive switching applications
Atomic layer deposition of TiO2 by TDMAT and H2O for resistive switching applications
Saved in:
Personal Name(s): | Reiner, M. |
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Aslam, N. / Hoffmann-Eifert, S. / Waser, R. | |
Contributing Institute: |
Elektronische Materialien; PGI-7 JARA-FIT; JARA-FIT |
Published in: |
Novel High-k Application Workshop |
Imprint: |
2012
|
Conference: | Dresden 2012-01-24 |
Document Type: |
Conference Presentation |
Research Program: |
Grundlagen für zukünftige Informationstechnologien |
Publikationsportal JuSER |
Description not available. |