This title appears in the Scientific Report :
2010
Formation and characterization of Ultra-Thin NiSi, Ni1-xPtxSi and epitaxial NiSi2on Si(001) substrates
Formation and characterization of Ultra-Thin NiSi, Ni1-xPtxSi and epitaxial NiSi2on Si(001) substrates
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Personal Name(s): | Knoll, L. |
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Zhao, Q. T. / Urban, C. / Habicht, S. / Fox, A. / Mantl, S. | |
Contributing Institute: |
Halbleiter-Nanoelektronik; IBN-1 JARA-FIT; JARA-FIT |
Published in: |
Materials for Advanced Metallization (MAM) Conference |
Imprint: |
2010
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Conference: | Mechelen, Belgium 2010-03-07 |
Document Type: |
Conference Presentation |
Research Program: |
Grundlagen für zukünftige Informationstechnologien |
Publikationsportal JuSER |
Description not available. |