This title appears in the Scientific Report :
2010
Formation and Characterization of Ultra-Thin Ni Silicides on Strained and Unstrained Silicon
Formation and Characterization of Ultra-Thin Ni Silicides on Strained and Unstrained Silicon
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Personal Name(s): | Zhao, Q. T. |
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Knoll, L. / Habicht, S. / Urban, C. / Bourdelle, K.K. / Mantl, S. | |
Contributing Institute: |
Halbleiter-Nanoelektronik; IBN-1 JARA-FIT; JARA-FIT |
Published in: |
IWJT 2010 |
Imprint: |
2010
|
Conference: | Shanghai, China 2010-05-10 |
Document Type: |
Conference Presentation |
Research Program: |
Grundlagen für zukünftige Informationstechnologien |
Publikationsportal JuSER |
Description not available. |