This title appears in the Scientific Report :
2010
Bipolar resistive switching: Mechanisms and scaling
Bipolar resistive switching: Mechanisms and scaling
Saved in:
Personal Name(s): | Bruchhaus, R. |
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Dittmann, R. / Waser, R. | |
Contributing Institute: |
Elektronische Materialien; IFF-6 JARA-FIT; JARA-FIT |
Published in: |
New Non-Volatile Memory Workshop 2010, Industrial Technology Research Institute (ITRI) |
Imprint: |
2010
|
Conference: | Hsinchu, Taiwan 2010-11-09 |
Document Type: |
Conference Presentation |
Research Program: |
Grundlagen für zukünftige Informationstechnologien |
Publikationsportal JuSER |
Description not available. |