This title appears in the Scientific Report :
2010
Please use the identifier:
http://dx.doi.org/10.1088/0957-4484/21/31/315301 in citations.
Titania-assisted electron-beam and synchrotron lithography
Titania-assisted electron-beam and synchrotron lithography
Novel imaging layer technology for electron-beam and extreme-ultraviolet lithographic processes based upon generation of Pd nanoparticles in the Pd(2+)-loaded TiO(2) films was developed. The electroless metallization of the patterned TiO(2):Pd(2+) films yields both negative and positive nickel image...
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Personal Name(s): | Skorb, E.V. |
---|---|
Grützmacher, D. / Dais, C. / Guzenko, V.A. / Sokolov, V.G. / Gaevskaya, T.V. / Sviridov, D.V. | |
Contributing Institute: |
Halbleiter-Nanoelektronik; IBN-1 JARA-FIT; JARA-FIT |
Published in: | Nanotechnology, 21 (2010) S. 315301 |
Imprint: |
Bristol
IOP Publ.
2010
|
Physical Description: |
315301 |
DOI: |
10.1088/0957-4484/21/31/315301 |
PubMed ID: |
20634573 |
Document Type: |
Journal Article |
Research Program: |
Grundlagen für zukünftige Informationstechnologien |
Series Title: |
Nanotechnology
21 |
Subject (ZB): | |
Publikationsportal JuSER |
Novel imaging layer technology for electron-beam and extreme-ultraviolet lithographic processes based upon generation of Pd nanoparticles in the Pd(2+)-loaded TiO(2) films was developed. The electroless metallization of the patterned TiO(2):Pd(2+) films yields both negative and positive nickel images with resolution down to approximately 100 nm. |