This title appears in the Scientific Report :
2012
Please use the identifier:
http://dx.doi.org/10.1016/j.jnoncrysol.2011.12.112 in citations.
Impact of DoS changes on resistance drift and threshold switching in amorphous phase change materials
Impact of DoS changes on resistance drift and threshold switching in amorphous phase change materials
Saved in:
Personal Name(s): | Krebs, Daniel |
---|---|
Schmidt, Rüdiger M. / Klomfaß, Josef / Luckas, Jennifer / Bruns, Gunnar / Schlockermann, Carl / Salinga, Martin / Carius, Reinhard / Wuttig, M. | |
Contributing Institute: |
Photovoltaik; IEK-5 |
Published in: | Journal of non-crystalline solids, 358 (2012) 17, S. 2412 - 2415 |
Imprint: |
Amsterdam [u.a.]
Elsevier Science
2012
|
DOI: |
10.1016/j.jnoncrysol.2011.12.112 |
Document Type: |
Journal Article |
Research Program: |
Thin Film Photovoltaics |
Publikationsportal JuSER |
Description not available. |