This title appears in the Scientific Report :
2013
Please use the identifier:
http://hdl.handle.net/2128/4570 in citations.
In-situ raman spectroscopy a method to study and control the growth of microcrystalline silicon for thin-film solar cells
In-situ raman spectroscopy a method to study and control the growth of microcrystalline silicon for thin-film solar cells
Optimum performance of a microcrystalline silicon ($\mu$c-Si:H) thin-film solar cell is achieved if the absorber layer material is deposited close to the phase transition towards amorphous Silicon. Hence exact knowledge about and control deposition process is of great importance. Raman spectroscopy...
Saved in:
Personal Name(s): | Muthmann, Stefan (Corresponding author) |
---|---|
Contributing Institute: |
Photovoltaik; IEK-5 |
Imprint: |
Jülich
Forschungszentrum Jülich GmbH Zentralbibliothek, Verlag
2012
|
Physical Description: |
X, 134 S. |
Dissertation Note: |
RWTH Aachen, Diss., 2012 |
ISBN: |
978-3-89336-774-0 |
Document Type: |
Book |
Series Title: |
Schriften des Forschungszentrums Jülich. Reihe Energie und Umwelt / energy and environment
133 |
Subject (ZB): | |
Link: |
OpenAccess |
Publikationsportal JuSER |
Optimum performance of a microcrystalline silicon ($\mu$c-Si:H) thin-film solar cell is achieved if the absorber layer material is deposited close to the phase transition towards amorphous Silicon. Hence exact knowledge about and control deposition process is of great importance. Raman spectroscopy is a characterization method, which allows to determine whether immportant materials properties fulfill the requirements of the narrow process window. This work deals with the design and application of a novel experiment, which enables in-situ Raman measurements during the parallel plate plasma enhanced chemical vapor deposition (PECVD) of $\mu$c-Si:H. Measurements of the crystalline volume fraction (I$^{RS}_{C}$) and the temperature of a growing film are carried out using the novol setup. To enable in-situ Raman measurement of central regions of the coated substrate in a PECVD system, optical access under normal incidence is necessary. An experimental setup in which an optical feed-through was integrated into a PECVD electrode was developed. [...] |