Hapke, P., Carius, R., Finger, F., Lambertz, A., Vetterl, O., & Wagner, H. (1996). Preparation of microcrystalline silicon with the layer-by-layer technique at various plasma excitation frequencies. Warrendale, Pa: MRS.

Hapke, P., R. Carius, F. Finger, A. Lambertz, O. Vetterl, andfavorite H. Wagner. Preparation of Microcrystalline Silicon With the Layer-by-layer Technique At Various Plasma Excitation Frequencies. Warrendale, Pa: MRS, 1996.

Hapke, P., et al. Preparation of Microcrystalline Silicon With the Layer-by-layer Technique At Various Plasma Excitation Frequencies. Warrendale, Pa: MRS, 1996.