This title appears in the Scientific Report :
2014
Please use the identifier:
http://dx.doi.org/10.1109/PVSC.2012.6317903 in citations.
In-situ determination of silane gas utilization and deposition rate for different deposition regimes of μc-Si:H using FTIR and OES in-situ
In-situ determination of silane gas utilization and deposition rate for different deposition regimes of μc-Si:H using FTIR and OES in-situ
| Personal Name(s): | Flikweert, A. J. (Corresponding Author) |
|---|---|
| Woerdenweber, J. / Grootoonk, B. / Zimmermann, T. / Gordijn, A. | |
| Contributing Institute: |
Photovoltaik; IEK-5 |
| Published in: |
Proceedings - ISBN 978-1-4673-0066-7 |
| Imprint: |
IEEE
2012
|
| Physical Description: |
1609-1612 |
| DOI: |
10.1109/PVSC.2012.6317903 |
| Conference: | 2012 IEEE 38th Photovoltaic Specialists Conference (PVSC), Austin (TX), 2012-06-03 - 2012-06-08 |
| Document Type: |
Contribution to a book Contribution to a conference proceedings |
| Research Program: |
Helmholtz Interdisciplinary Doctoral Training in Energy and Climate Research (HITEC) Thin Film Photovoltaics |
| Publikationsportal JuSER |
| Description not available. |