This title appears in the Scientific Report :
2014
Please use the identifier:
http://dx.doi.org/10.1109/PVSC.2012.6317903 in citations.
In-situ determination of silane gas utilization and deposition rate for different deposition regimes of μc-Si:H using FTIR and OES in-situ
In-situ determination of silane gas utilization and deposition rate for different deposition regimes of μc-Si:H using FTIR and OES in-situ
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Personal Name(s): | Flikweert, A. J. (Corresponding Author) |
---|---|
Woerdenweber, J. / Grootoonk, B. / Zimmermann, T. / Gordijn, A. | |
Contributing Institute: |
Photovoltaik; IEK-5 |
Published in: |
Proceedings - ISBN 978-1-4673-0066-7 |
Imprint: |
IEEE
2012
|
Physical Description: |
1609-1612 |
DOI: |
10.1109/PVSC.2012.6317903 |
Conference: | 2012 IEEE 38th Photovoltaic Specialists Conference (PVSC), Austin (TX), 2012-06-03 - 2012-06-08 |
Document Type: |
Contribution to a book Contribution to a conference proceedings |
Research Program: |
Helmholtz Interdisciplinary Doctoral Training in Energy and Climate Research (HITEC) Thin Film Photovoltaics |
Publikationsportal JuSER |
Description not available. |