This title appears in the Scientific Report :
2012
Characterization of Lanthanum Lutetium oxide high-k / metal gate stacks for CMOS process integration
Characterization of Lanthanum Lutetium oxide high-k / metal gate stacks for CMOS process integration
Saved in:
Personal Name(s): | Nichau, A. |
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Schubert, J. / Rubio-Zuazo, J. / Besmehn, A. / Schnee, M. / Schäfer, A. / Castro, G.R. / Mantl, S. | |
Contributing Institute: |
Halbleiter-Nanoelektronik; PGI-9 JARA-FIT; JARA-FIT |
Published in: |
SpLine Users' Meeting |
Imprint: |
2012
|
Conference: | Madrid, Spanien 2012-04-16 |
Document Type: |
Poster |
Research Program: |
Grundlagen für zukünftige Informationstechnologien |
Publikationsportal JuSER |
Description not available. |