This title appears in the Scientific Report :
2015
Comparison of the Resistance Switching Behavior of Ex-situ and In-situ STO Thin Films grown by Atomic Layer Deposition
Comparison of the Resistance Switching Behavior of Ex-situ and In-situ STO Thin Films grown by Atomic Layer Deposition
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Personal Name(s): | Zhang, Hehe |
---|---|
Lee, W. / Xu, Chengcheng / Hardtdegen, Alexander / Menzel, Stephan / Hwang, C. S. / Waser, R. / Hoffmann-Eifert, Susanne | |
Contributing Institute: |
Elektronische Materialien; PGI-7 |
Imprint: |
2015
|
Conference: | European Materials Research Society meeting, Lille (France), 2015-05-11 - 2015-05-15 |
Document Type: |
Poster |
Research Program: |
Controlling Electron Charge-Based Phenomena |
Publikationsportal JuSER |
Description not available. |