Lanzerath, F., Buca, D., Trinkaus, H., Goryll, M., Mantl, S., Knoch, J., . . . Ghyselen, B. (2008). Boron activation and diffusion in silicon and strained silicon-on-insulator by rapid thermal and flash lamp annealings. Melville, NY: American Institute of Physics.
Chicago Style CitationLanzerath, F., D. Buca, H. Trinkaus, M. Goryll, S. Mantl, J. Knoch, U. Breuer, W. Skorupa, andfavorite B. Ghyselen. Boron Activation and Diffusion in Silicon and Strained Silicon-on-insulator By Rapid Thermal and Flash Lamp Annealings. Melville, NY: American Institute of Physics, 2008.
MLA CitationLanzerath, F., et al. Boron Activation and Diffusion in Silicon and Strained Silicon-on-insulator By Rapid Thermal and Flash Lamp Annealings. Melville, NY: American Institute of Physics, 2008.