This title appears in the Scientific Report :
1999
Optimized technology for freely positionable Josephson junctions in YBa2Cu3O(7-x) fabricated by local ion damaging
Optimized technology for freely positionable Josephson junctions in YBa2Cu3O(7-x) fabricated by local ion damaging
Saved in:
Personal Name(s): | Hollkott, J. |
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Jaekel, C. / Spangenberg, B. / Kurz, H. / Kahlmann, F. | |
Contributing Institute: |
Institut für Schicht- und Ionentechnik; ISI |
Published in: | IEEE transactions on applied superconductivity, 8 (1999) S. 39 |
Imprint: |
New York, NY
IEEE
1999
|
Physical Description: |
39 |
Document Type: |
Journal Article |
Research Program: |
Ionentechnik |
Series Title: |
IEEE Transactions on Applied Superconductivity
8 |
Publikationsportal JuSER |
Description not available. |