This title appears in the Scientific Report :
1999
Low temperature nanoscopic kinetics of plasma-assisted Si-microcrystallization in a-Si:H for photovoltaics and microelectronics applications
Low temperature nanoscopic kinetics of plasma-assisted Si-microcrystallization in a-Si:H for photovoltaics and microelectronics applications
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Personal Name(s): | Khait, Y. L. |
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Weil, R. / Besermann, R. / Edelman, F. / Beyer, W. / Rech, B. | |
Contributing Institute: |
Institut für Schicht- und Ionentechnik; ISI |
Published in: |
11th International Meeting on Electro-Optics and Microelectronics |
Imprint: |
1999
|
Conference: | Tel Aviv, Israel 1999-09-14 00:00:00 |
Document Type: |
Conference Presentation |
Research Program: |
Grundlagen und Technologie von Dünnschichtsolarzellen |
Publikationsportal JuSER |
Description not available. |