This title appears in the Scientific Report :
1999
SIMS depth profile analysis of oxygen contamination in hydrogenated amorphous and microcrystalline silicon
SIMS depth profile analysis of oxygen contamination in hydrogenated amorphous and microcrystalline silicon
Saved in:
Personal Name(s): | Mück, A. |
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Zastrow, U. / Vetterl, O. / Rech, B. | |
Contributing Institute: |
Institut für Schicht- und Ionentechnik; ISI |
Published in: |
Proceedings of the 12th International Conference on Secondary Ion Mass Spectrometry, Brussels, 5.-11.9.1999 |
Imprint: |
1999
|
Document Type: |
Contribution to a book Contribution to a conference proceedings |
Research Program: |
Grundlagen und Technologie von Dünnschichtsolarzellen |
Publikationsportal JuSER |
Description not available. |