This title appears in the Scientific Report :
1999
Please use the identifier:
http://hdl.handle.net/2128/4428 in citations.
Spektroskopische Charakterisierung von Schichten und Schichtsystemen aus porösem Silicium im Hinblick auf optische und optoelektronische Anwendungen
Spektroskopische Charakterisierung von Schichten und Schichtsystemen aus porösem Silicium im Hinblick auf optische und optoelektronische Anwendungen
Investigations were made on both, single layers and layer systems of porous silicon, using optical spectroscopy, gravimetry, diffractrometry and topographic methods, and REM and TEM aswell. Main emphasis of the investigations was concentrated to the optimization of single layers and layer systems wi...
Saved in:
Personal Name(s): | Thönissen, M. (Corresponding author) |
---|---|
Contributing Institute: |
Institut für Schicht- und Ionentechnik; ISI |
Imprint: |
Jülich
Forschungszentrum, Zentralbibliothek
1999
|
Dissertation Note: |
Aachen, Techn. Hochsch., Diss., 1999 |
Document Type: |
Book Dissertation / PhD Thesis |
Research Program: |
ohne FE |
Series Title: |
Berichte des Forschungszentrums Jülich
3628 |
Subject (ZB): | |
Link: |
OpenAccess |
Publikationsportal JuSER |
Investigations were made on both, single layers and layer systems of porous silicon, using optical spectroscopy, gravimetry, diffractrometry and topographic methods, and REM and TEM aswell. Main emphasis of the investigations was concentrated to the optimization of single layers and layer systems with a view to application and basic studies, aiming at an industrial applicability in optical and opto-electronic components. The results of the investigations presented here show new ways of applications by using porous silicon, e.g., electrically controllable filter structures on the basis of liquid crystals, diffraction gratings of porous silicon and spectral sensitive photodiodes. |