This title appears in the Scientific Report :
1999
Please use the identifier:
http://hdl.handle.net/2128/17201 in citations.
Connection between hydrogen plasma treatment and etching of amorphous phase in the layer-by-layer technique with very high frequency plasma excitation
Connection between hydrogen plasma treatment and etching of amorphous phase in the layer-by-layer technique with very high frequency plasma excitation
Saved in:
Personal Name(s): | Vetterl, O. |
---|---|
Hapke, P. / Houben, L. / Finger, F. / Carius, R. W. / Wagner, H. | |
Contributing Institute: |
Institut für Schicht- und Ionentechnik; ISI |
Published in: | Journal of applied physics, 85 (1999) S. 2991 - 2993 |
Imprint: |
Melville, NY
American Institute of Physics
1999
|
Physical Description: |
2991 - 2993 |
Document Type: |
Journal Article |
Research Program: |
ohne FE |
Series Title: |
Journal of Applied Physics
85 |
Link: |
OpenAccess OpenAccess |
Publikationsportal JuSER |
Description not available. |